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This
page last updated on
January 13, 2005
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The
ND Nanofabrication Facility
This laboratory allows fabrication of ICs and devices
with geometries to 0.02 microns. In cleanroom areas
are a photomask generator, contact mask aligners,
wafer stepper, furnace tubes, plasma etcher, LPCVD,
PECVD, RIE (conventional and ICP), RTA, wire bonders
and several evaporators. Inspection includes a JEOL
SEM and Hitachi S-4500 FESEM, JEOL TEM, ellipsometer,
prism coupler, surface profiler, and 4-point probe.
Nanolithography is by a 50kV SEM/EBL. Advanced measurement
capabilities include HP 4145B/4155B SPAs, Hall Effect,
DLTS and Keithley I-V and C-V systems. (Bernstein,
Fay, Hall, Kosel, Merz, Seabaugh, and Snider)
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The Optoelectronics Laboratory
Here
you will find extensive equipment dedicated to compound
semiconductor processing and optoelectronic materials
and device characterization, including a variable
angle spectroscopic ellipsometer, 10-watt Argonion
laser, cw Titanium Sapphire laser, diode lasers, related
detector and optical systems for photoluminescence
and waveguide analysis, an optical spectrum analyzer,
and an optical fiber fusion splicer. (Hall)
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The
Cryogenic Characterization
Laboratory
In
this laboratory, electrical measurements of devices
can be performed anywhere between room temperature
and 10 mK, and in magnetic fields up to 11T. Several
cryogenic systems are available, including two 300
mK Helium cryostat and a dilution refrigerator. This
facility specializes in low noise, and high speed
measurements, especially useful for the department's
nanoelectronics effort. (Snider and Bernstein)
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The Nano-Optics
Laboratory
The Nano-Optics Laboratory provides unique
capabilities for ultra high spatial, temporal, and spectral
resolution measurements. Equipment includes two Argon
ion lasers, a tunable, mode-locked titanium-sapphire
laser delivering femtosecond pulses, a helium-cadmium
laser, dye lasers, two near-field scanning optical microscopes
(NSOM), a Fourier transform infra-red spectrometer (FTIR),
a Digital Instruments atomic force microscope (AFM),
a 12 Tesla magnet, and several helium cryostats and
spectrometers. One of the NSOM systems allows near-field
optical measurements at cryogenic temperatures and magnetic
fields up to 12 T. (Merz)
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The
High-Speed Circuits and Devices Laboratory
The High-Speed Circuits laboratory houses a state-of-the-art
MMIC design and characterization facility which includes
two Cascade microwave probe stations, a 40 GHz vector
network analyzer, on-wafer noise analysis to 26 GHz, ultrawideband
signal analysis system, 2 4-channel 50 GHz digital storage
oscilloscopes for mixed-signal analysis, a 12.5 Gb/s digital
pulse pattern generator and bit-error rate tester (BERT),
and a 40 Gb/s multiplexer. The lab offers the capability
for optoelectronic characterization of high-speed detector
and photoreceiver subsystems to 50 GHz. Learn more about
this lab at its own website. (Fay)
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The
Device Simulation Laboratory
This laboratory has a state-of-the-art cluster of Workstations,
with graphics capability and ready access to supercomputers.
(Lent and Porod) |
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