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- Contact:
- Email: mwistey (at) nd (dot) edu
- Phone: 631-1639
- Fax: 631-4393
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Wistey Group Research Page
What we do: Study novel device physics and create new nanoelectronics
and optoelectronics by enabling defect-free growth
of new nanostructures and materials.
We create lasers, photovoltaics, transistors,
modulators, and detectors, and the materials for new devices,
and ultimately optical neural interfaces.
Silicon Photonics and Heteroepitaxy
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Heterogeneous integration:
A project I initiated led to the discovery of techniques for growing
defect-free Ge on Si using novel gas precursors. This enables both
GaAs-based optoelectronics and III-V CMOS on silicon. The Ge was
nearly strain-neutral at typical device temperatures, providing
improved reliability for high power devices.
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I developed a device process flow for GeSn photodetectors and
modulators in the mid-IR, making silicon photonics a realistic
possibility for future optoelectronics.
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Silicon photonics:
Silicon is notoriously unreactive with light, and the other Group IV
elements (Ge, Sn, C) are hardly better. My research has opened
several avenues which are likely to produce efficient Group IV
photodetectors, solar cells, and even lasers. Stay tuned! Or better
still, come join a group spanning from interesting physics to applied
devices.
III-V MOSFETs
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As a postdoc at U.C. Santa Barbara, I led the growth and fabrication teams
which made
the first scalable III-V MOSFETs, using self-aligned techniques.
These are the first
III-V FETs which can be scaled to nanometer dimensions (20-50nm),
to extend Moore's Law for several generations beyond silicon.
This work is a delightful collaboration among multiple groups and
different universities, ranging from atomic theory to circuits and
from California to Massachusetts.
At UCSB (as at Stanford), the boundaries between departments are
fuzzy, leading to some of the most exciting research collaborations,
with different viewpoints available to tackle any problem, and
interesting new challenges every day.
- Self-aligned, low resistance contacts:
Molecular beam epitaxy (MBE) is a line-of-sight deposition technique,
but my work has been able to fill in recesses under the edges of the
gate in a MOSFET. We have also produced the lowest contact resistances
to InGaAs to date. Low resistance is vital for THz electronics.
Lasers for Metro Area Networks and Fiber-to-the-Home
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1540nm VCSELs: The first electrically-pumped, dilute nitride VCSELs
in the telecommunication band near 1550 nm, for inexpensive, high
speed fiber communications. (See reprints at left.) My
PhD
thesis (5.9 MB) is available too.
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