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Notre Dame Piezoflexure Nanofabrication (PEN) System shown above at Denton Vacuum, Moorestown, NJ, on September 22, 2005. Pictured from left to right are Keith Darr, Zoltan Racz, Richard Wang (Denton Vacuum), and Alan Seabaugh. This instrument enables fabrication of nanoelectronic and nanoelectromechanical devices with feature sizes defined by the nanotranslation of stencil masks. The approach is based on sidewall processing of piezoflexure-translated stencil masks in an electron beam evaporator. The instrument and it’s development were sponsored by the NSF Major Research Instrumentation Program and the University of Notre Dame. |
RESEARCH
INTERESTS |
|
Seabaugh’s
group explores new devices and circuits enabled by engineering at
the nanoscale. Of particular interest are high speed and low power
transistors, tunneling devices, tunnel diode/transistor circuits,
and nanomechanical devices. These devices are based on various materials
systems including indium arsenide, indium phosphide, gallium nitride,
silicon, and germanium. |
Press Downloads for recent publications. |